Struggling to choose the right Technology for the application, we help you down select, Design and integrate

HIPIMS

Ionized sputtering technology for controlling coating morphology, 3D coverage and deposition on unbiased non-conductive surfaces

ATOMIC LAYER DEPPOSITION

The non-line of sight process provides advantages over other deposition techniques at small scales such as high aspect ratio substrates up to 4000:1, 3D structures of large physical size (compatible with process chamber), s Small feature sizes such as below 10 nm, Tuning of metal-semiconductor interfaces, tuning fermi-states of semiconductor-semiconductor interfaces and production of amorphous films.

Plasma Electrolytic Processing

Environmentally friendly surface modification technology for oxidation and polishing of metals as well as stripping of powder and hard coatings