By combining hybrid processes of ALD and PVD and PECVD into the one system, a greater range of flexibility is possible allowing materials scientists to produce novel coatings architectures, structures and properties that arise from the different capabilities. With ALD having aspect ratios of up to 5000:1, the pin holes and voids around macroparticles found within other deposition techniques are easily filled for enhanced oxidation, barrier and diffusion layers. Even just a few nanometers of ALD can help change the structural growth of a following PVD layer, allowing novel layer stacks to be built.

The Series SC-1 Hybrid system is for leading groups in:

• Semiconductor stack formation

• High Temperature applications

• Metamaterials

• Batteries

• Solar Cells (i.e., Perovskites)

• Mechanics

• Optics

• Medical

We are really excited by the SC-1 hybrid coater for R&D, to develop novel materials and structures using ALD combined with PVD or PECVD deposition.

PVD materials on the System

• Sputtering (Metals, Nitrides)

• Evaporation (Li, Na and Metal-Organics)

ALD materials on the System

• Oxides (Al2O3, TiO2, ZnO, ZrO2, HfO2, LiOx)

• Nitrides and Fluorides

• Combination (LiPON, LiF,LiNb3O8)

• Thermal and MW Plasma process

• Ozone pre-treatments or as process gas

unique features:

• Glovebox integration with direct access to ALD/PVD chambers.

• Unique, patented, pioneering technology.

• Combination ALD / PVD

• Unmatched metrology capabilities

Find out more here: Series SC-1